Nanoelectrode lithography and multiple patterning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2966-2969

  Yokoo, A ^a  

^a Bio Medical Informatics Research Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ELECTRODES; ELECTRON BEAM LITHOGRAPHY; ETCHING; MASKS; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON;

MULTIPLE PATTERNING; NANOELECTRODE LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0942267533     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1621667     Document Type: Conference Paper

References (8)

1. B. D. Terris, H. J. Mamin, M. E. Best, J. A. Logan, D. Rugar, and S. A. Rishton, Appl. Phys. Lett. 69, 4262 (1996).
2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, J. Vac. Sci. Technol. B 14, 4129 (1996).
3. M. Colburn et al., Proc. SPIE 3676, 379 (1999).
4. S. W. Pang, T. Tamamura, M. Nakao, A. Ozawa, and H. Masuda, J. Vac. Sci. Technol. B 16, 1145 (1998).
5. E. S. Snow, P. M. Campbell, and P. J. McMarr, Appl. Phys. Lett. 63, 749 (1993).
6. A. Majumder, P. I. Oden, J. P. Carrejo, L. A. Nagahara, J. J. Graham, and J. Alexander, Appl. Phys. Lett. 61, 2293 (1992).
7. Y. Matsuzaki, S. Hasui, S. Kamada, A. Yamada, and M. Konagai, Jpn. J. Appl. Phys., Part 1 40, 4325 (2001).
8. A. Yokoo, Jpn. J. Appl. Phys., Part 2 42, L92 (2003).