Postassembly chemical modification of a highly ordered organosilane multilayer: New insights into the structure, bonding, and dynamics of self-assembling silane monolayers

ACS Nano

Volumn 2, Issue 3, 2008, Pages 579-599

  Wen, Ke ^a,d   Maoz, Rivka ^a   Cohen, Hagai ^a   Sagiv, Jacob ^a   Gibaud, Alain ^b   Desert, Anne ^b   Ockos, Benjamin M ^c  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

^b UNIVERSITÉ DU MAINE   (France)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

^d EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

Chemical modification; Contact angle; Covalent bonding; Hydrogen bonding; Infrared spectroscopy; Molecular organization; Organosilane monolayers; Organosilane multilayers; Self assembling monolayers; X ray photoelectron spectroscopy; X ray scattering

Indexed keywords

ANGLE MEASUREMENT; CANNING; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; COMPUTER NETWORKS; CONTACT ANGLE; COVALENT BONDS; DEPOSITION; DEPOSITS; DYNAMICAL SYSTEMS; DYNAMICS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; MECHANICS; MOLECULES; MONOLAYERS; MONOMERS; MULTILAYER FILMS; MULTILAYERS; NEUTRON SCATTERING; PHOTOELECTRON SPECTROSCOPY; POLYMERS; SCATTERING; SELF ASSEMBLED MONOLAYERS; SELF ASSEMBLY; SILANES; SILICON; SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; STRUCTURAL ANALYSIS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SCATTERING; X RAY SPECTROSCOPY; X RAYS;

(1 1 0) SURFACE; (E ,3E) PROCESS; ALCOHOL GROUP; AMERICAN CHEMICAL SOCIETY (ACS); ANALYSIS OF DATA; BIFUNCTIONAL; CHEMICAL; CONTACT-ANGLE MEASUREMENTS; COVALENT BONDING; EXPERIMENTAL EVIDENCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY (MIT FTIR); HEADGROUPS; IN-SITU; INTERLAYER BONDING; LAYER BY LAYER (LBL); MOLECULAR ARCHITECTURES; MOLECULAR ARRANGEMENTS; MOLECULAR ORGANIZATIONS; MULTILAYER (ML); MULTILAYER STACKING; NANO FABRICATION; ORDERED LAYER; ORGANOSILANE; POLAR GROUPS; QUANTITATIVE EVALUATION; SELF-ASSEMBLED; SELF-ASSEMBLING; SELF-ASSEMBLY; SILANE MONOLAYERS; SILICON OXIDES; STRUCTURAL DATA; SYNCHROTRON X-RAY SCATTERING; WET CHEMICAL OXIDATION; X RAY SCATTERING; XPS DATA;

CHEMICAL MODIFICATION;

NANOMATERIAL; ORGANIC COMPOUND; SILANE DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

COMPUTER SIMULATION; CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MODELS, CHEMICAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; ORGANIC CHEMICALS; PARTICLE SIZE; SILANES; SURFACE PROPERTIES;

EID: 45149122107     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn800011t     Document Type: Article

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114. Tidswell, I. M.; Ocko, B. M.; Pershan, P. S.; Wasserman, S. R.; Whitesides, G. M.; Axe, J. D. X-Ray Specular Reflection Studies of Silicon Coated by Organic Monolayers (Alkylsiloxanes). Phys. Rev. B 1990, 41, 1111-1128.
115. McWan, D. B.; Gurvitch, M.; Rowell, J. M.; Walker, L. R. Structure and Coherence of NbAl Multilayer Films. J. Appl. Phys. 1983, 54, 3886-3891.
116. OH monolayer is obviously free of oxygen contributions from the top functions of an underlying monolayer. Therefore, the fitting of the interface between the first layer and the silicon substrate must also compensate for the discrepancy caused by this assumption.
117. 115.
118. Brunner, H.; Vallant, T.; Mayer, U.; Hoffmann, H. Stepwise Growth of Ultrathin SiOx Films on Si(100) Surfaces through Sequential Adsorption/ Oxidation Cycles of Alkylsiloxane Monolayers. Langmuir 1996, 12, 4614-4617.
119. OH to the silane headgroup slabs in the unreacted film (Figure 5a, Table 1).
120. Lamont, C. L. A.; Wilkes, J. Attenuation Length of Electrons in Self-Assembled Monolayers of n-Alkanethiols on Gold. Langmuir 1999, 15, 2037-2042.
121. Hofmann, S. In Practical Surface Analysis. Auger and X-Ray Photoelectron Spectroscopy, 2nd ed.; Briggs, D., Seah M. P., Eds.; John Wiley & Sons: Chichester, U.K., 1990; Vol. 1, p 143.
122. 122 but rather effective empirical values well suited to the characterization of the present stratified films made of alternate hydrocarbon and thinner polar strata containing Si and O atoms.
123. Textor, M., Ruiz, L.; Hofer, R.; Rossi, A.; Feldman, K.; Hähner, G.; Spencer, N. D. Structural Chemistry of Self-Assembled Monolayers of Octadecylphosphoric Acid on Tantalum Oxide Surfaces. Langmuir 2000, 16, 3257-3271.
124. Laibinis, P. E.; Bain, C. D.; Whitesides, G. M. Attenuation of Photoelectrons in Monolayers of n-Alkanethiols Adsorbed on Copper, Silver, and Gold. J. Phys. Chem. 1991, 95, 7017-7021.
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126. 90 (see Experimental Section).
127. OH.
128. Parikh, A. N.; Schivley, M. A.; Koo, E.; Seshadri, K.; Aurentz, D.; Mueller, K.; Allara, D. L. n-Alkylsiloxanes: From Single Monolayers to Layered Crystals. The Formation of Crystalline Polymers from the Hydrolysis of n-Octadecyltrichlorosilane. J. Am. Chem. Soc. 1997, 119, 3135-3143.
129. Rye, R. R. Transition Temperatures for n-Alkyltrichlorosilane Monolayers. Langmuir 1997, 13, 2588-2590.
130. Fontaine, P.; Goldmann, M.; Rondelez, F. Influence of Headgroup Cross-Linking on Chain Packing in Langmuir Monolayers of n-Alkyltrialkoxysilanes. Langmuir 1999, 15, 1348-1352.
131. 16,17 suggests that the formation of a complete, densely packed silane monolayer from a solution of its trichlorosilane precursor does not necessarily require full hydrolysis of all three Si-Cl bonds of the precursor prior or during the monolayer assembly step at the liquid-solid interface. The hydrolysis and subsequent final lateral organization of the sliane head groups may be completed upon contact with the ambient humidity following withdrawal of the monolayer covered substrate from the adsorption solution.