Deep UV photochemistry and patterning of self-assembled monolayer films

Thin Solid Films

Volumn 210-211, Issue PART 1, 1992, Pages 359-363

  Calvert, J M ^a   Georger, J H ^a   Schnur, J M ^a   Schoen, P E ^a   Peckerar, M C ^a   Pehrsson, P E ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ULTRAVIOLET RADIATION;

MONOLAYER FILMS; ORGANOSILANE; PHOTOCHEMISTRY; REACTIVE ION ETCHING;

FILMS;

EID: 0026851067     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(92)90257-C     Document Type: Article

References (21)

1. Contact angles, wettability and adhesion