Effect of low-frequency power on dual-frequency capacitively coupled plasmas

Journal of Physics D: Applied Physics

Volumn 41, Issue 20, 2008, Pages

  Yuan, Q H ^a   Xin, Y ^a   Yin, G Q ^b   Huang, X J ^a   Sun, K ^a   Ning, Z Y ^a  

^a SOOCHOW UNIVERSITY   (China)

^b SICHUAN UNIVERSITY OF SCIENCE AND ENGINEERING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA DENSITY; PLASMA DIAGNOSTICS;

CAPACITIVELY COUPLED PLASMAS; DUAL FREQUENCIES; ELECTRON ENERGY PROBABILITY FUNCTIONS; ELECTROSTATIC PROBES; HIGH FREQUENCIES; INDEPENDENT CONTROLS; ION BOMBARDMENT ENERGIES; LANGMUIR; LOWER PRESSURES; PLASMA CHARACTERISTICS; PLASMA PARAMETERS; POWER ON; SIMULATION RESULTS;

PLASMAS;

EID: 56349148897     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/20/205209     Document Type: Article

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