Model-based analysis of plasma parameters and active species kinetics in Cl2 X (X=Ar, He, N2) inductively coupled plasmas

Journal of the Electrochemical Society

Volumn 155, Issue 12, 2008, Pages

  Efremov, Alexander ^a   Min, Nam Ki ^b   Choi, Bok Gil ^c   Baek, Kyu Ha ^d   Kwon, Kwang Ho ^b  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

^b Korea University   (South Korea)

^c Kongju National University   (South Korea)

^d Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; HELIUM; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PHOTORESISTS; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; PLASMA DEVICES; PLASMAS; PRASEODYMIUM COMPOUNDS;

ACTIVE SPECIES; ADDITIVE GASES; AND MODELS; DISSOCIATION KINETICS; ELECTRON IMPACTS; ETCH RATES; GAS MIXING RATIOS; INDUCTIVELY COUPLED PLASMA REACTORS; MODEL-BASED; PLASMA MODELS; PLASMA PARAMETERS; QUADRUPOLE MASS SPECTROSCOPIES; QUALITATIVE DIFFERENCES; STATE DENSITIES;

PLASMA DIAGNOSTICS;

EID: 54949086807     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2993160     Document Type: Article

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