Plasma-surface kinetics and simulation of feature profile evolution in Cl2 + HBr etching of polysilicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 2106-2114

  Jin, Weidong ^a   Vitale, Steven A ^a   Sawin, Herbert H ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHLORINE; COMPOSITION; ETCHING; POLYSILICON; QUARTZ; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

ION IMPINGEMENT ENERGY;

REACTION KINETICS;

EID: 0036865090     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1517993     Document Type: Article

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