Deposition of W Nx Cy for diffusion barrier application using the imido guanidinato complex W (Ni Pr) Cl3 [Pri NC (N Me2) Ni Pr]

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 5, 2008, Pages 1800-1807

  Ajmera, Hiral M ^a   Heitsch, Andrew T ^a   Anderson, Timothy J ^a   Wilder, Corey B ^b   Reitfort, Laurel L ^b   McElwee White, Lisa ^b   Norton, David P ^a  

^a J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

^b University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GUANIDINATO;

TUNGSTEN;

TUNGSTEN COMPOUNDS;

EID: 53349096958     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2981082     Document Type: Article

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