Chemical vapor deposition growth and properties of TaCxNy

Thin Solid Films

Volumn 418, Issue 2, 2002, Pages 145-150

  Engbrecht, E R ^a   Sun, Y M ^b   Smith, S ^c   Pfiefer, K ^c   Bennett, J ^c   White, J M ^b   Ekerdt, J G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c SEMATECH   (United States)

Author keywords

Carbides; Copper; Diffusion; Tantalum

Indexed keywords

ANNEALING; COMPOSITION; COPPER; DIFFUSION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM COMPOSITIONS;

THIN FILMS;

EID: 0037109181     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00724-1     Document Type: Article

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