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Applied Surface Science

Volumn 125, Issue 3-4, 1998, Pages 313-320

Rbs-erda, xps and xrd characterizations of pecvd tungsten nitride films

(7) Meunier, C a Monteil, C b Savall, C e Palmino, F e Weber, J f Berjoan, R c Durand, J d

a Lab de Metrologie des Interfaces T (France)

b Espace Cezanne (France)

c Centre National de la Recherche Scientifique (France)

d UNIVERSITÉ DE MONTPELLIER (France)

e CNRS (France)

f UNIVERSITY OF NEUCHÂTEL (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; SUBSTRATES; SURFACE PROPERTIES; SYNTHESIS (CHEMICAL); THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); TUNGSTEN NITRIDE;

TUNGSTEN COMPOUNDS;

EID: 0032025346 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)00383-8 Document Type: Article

Times cited : (22)

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