Volatile liquid precursors for the chemical vapor deposition (CVD) of thin films containing tungsten

Materials Research Society Symposium - Proceedings

Volumn 612, Issue , 2000, Pages

  Gordon, R G ^a   Barry, S ^a   Broomhall Dillard, R N R ^a   Wagner, V A ^a   Wang, Y ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; DIFFUSION IN SOLIDS; SUBSTRATES; TUNGSTEN COMPOUNDS; VAPORIZATION;

VOLATILE LIQUID PRECURSORS;

THIN FILMS;

EID: 0034429741     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-612-d9.12.1     Document Type: Conference Paper

References (16)