Investigation of the structure of tungsten oxide films obtained by chemical vapor deposition

EPJ Applied Physics

Volumn 11, Issue 3, 2000, Pages 167-174

  Gogova, D ^a   Gesheva, K ^a   Kakanakova Georgieva, A ^b   Surtchev, M ^c  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b LINKÖPING UNIVERSITY   (Sweden)

^c UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; COLORIMETRY; COMPOSITION EFFECTS; MAGNETIC RESONANCE SPECTROSCOPY; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; SPECTROPHOTOMETRY; THERMOGRAVIMETRIC ANALYSIS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIFFERENTIAL THERMOGRAVIMETRY;

THIN FILMS;

EID: 0034272426     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2000159     Document Type: Article

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