Review of technology for 157-nm lithography

IBM Journal of Research and Development

Volumn 45, Issue 5, 2001, Pages 605-613

  Bates, A K ^a   Rothschild, M ^a   Bloomstein, T M ^a   Fedynyshyn, T H ^a   Kunz, R R ^a   Liberman, V ^a   Switkes, M ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CONTAMINATION; IMAGING SYSTEMS; LASER PULSES; LIGHT ABSORPTION; MASKS; MIRRORS; OPTICAL MATERIALS; OPTICS; PHOTORESISTS; SILICON WAFERS; SURFACES;

CATADIOPTRIC; CHROMELESS PHASE SHIFTING MASK; MICROSTEPPER; PELLICLES; SCHWARZSCHILD IMAGING SYSTEM; WAFER EXPOSURE SYSTEM;

PHOTOLITHOGRAPHY;

EID: 0035465567     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.455.0605     Document Type: Article

References (22)

1. 157 nm Technical Data Review