Patterning Sub-50 nm features with near-field embedded-amplitude masks

Applied Physics Letters

Volumn 81, Issue 7, 2002, Pages 1315-1317

  Goodberlet, James G ^a   Kavak, Hamide ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b CUKUROVA UNIVERSITY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

FEATURE SIZES; FINE PATTERN; NEAR-FIELD; OPTICAL NEAR FIELD; SUB-50 NM;

PHYSICAL PROPERTIES;

PHYSICS;

EID: 79956058583     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1495538     Document Type: Article

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