Near-field optical lithography using a planar silver lens

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3470-3474

  Melville, David O S ^a   Blaikie, Richard J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FINITE DIFFERENCE METHOD; LENSES; MERCURY VAPOR LAMPS; METALLIC FILMS; PHOTORESISTORS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SILVER; SPUTTERING; SUBSTRATES; TIME DOMAIN ANALYSIS;

ETCH MASKS; EVANESCENT NEAR FIELD OPTICAL LITHOGRAPHY (ENFOL); PLANAR LENS LITHOGRAPHY (PLL); SILVER LENS;

PHOTOLITHOGRAPHY;

EID: 13244268687     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1813462     Document Type: Conference Paper

References (14)

1. J. G. Goodberlet and H. Kavak, Appl. Phys. Lett. 81, 1315 (2002).
2. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, and D. R. S. Cumming, Appl. Phys. Lett. 75, 3560 (1999).
3. V. G. Veselago, Sov. Phys. Usp. 10, 509 (1968).
4. J. B. Pendry, Phys. Rev. Lett. 85, 3966 (2000).
5. R. J. Blaikie and S. J. McNab, Microelectron. Eng. 61-62, 97 (2002).
6. D. O. S. Melville, R. J. Blaikie, and C. R. Wolf, Appl. Phys. Lett. 84, 4403 (2004).
7. K. R. Williams and R. S. Muller, J. Microelectromech. Syst. 5, 256 (1996).
8. S. J. McNab and R. J. Blaikie, Appl. Opt. 39, 20 (2000).
9. X. S. Rao and C. K. Ong, Phys. Rev. E 68, 067601 (2003).
10. R. W. Ziolkowski and E. Heyman, Phys. Rev. E 64, 056625 (2001).
11. S. Foteinopoulou, E. N. Economou, and C. M. Soukoulis, Phys. Rev. Lett. 90, 107402 (2003).
12. N. Fang and X. Zhang, Appl. Phys. Lett. 82, 161 (2003).
13. A. Taflove and S. C. Hagness, Computational Electrodynamics: The Finite-Difference Time-Domain Method, 2nd ed. (Artech House, Boston, 2000).
14. P. B. Johnson and R. W. Christy, Phys. Rev. B 6, 4370 (2003).