Comparison of electrolyte performance for Ta2O5 thin films produced by pulsed and continuous wave PECVD

Journal of the Electrochemical Society

Volumn 155, Issue 6, 2008, Pages

  Seman, Michael T ^a,b   Robbins, Joshua J ^b   Leonhardt, Darin ^c   Agarwal, Sumit ^a   Wolden, Colin A ^a,d  

^a Department of Geology and Geological Engineering   (United States)

^b CMD Research LLC   (United States)

^c University of New Mexico   (United States)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TANTALUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROXYL IMPURITIES; IMPEDANCE SPECTROSCOPY; NONSTOICHIOMETRIC COMPOSITION;

THIN FILMS;

EID: 43049125511     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2901139     Document Type: Article

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