Optical properties and thermal stability of TiAlN/AlON tandem absorber prepared by reactive DC/RF magnetron sputtering

Solar Energy Materials and Solar Cells

Volumn 92, Issue 11, 2008, Pages 1425-1433

  Barshilia, Harish C ^a   Selvakumar, N ^a   Rajam, K S ^a   Biswas, A ^b  

^a SURFACE ENGINEERING DIVISION   (India)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Aluminum oxynitride; Optical properties; Sputtering; Tandem absorber; Titanium aluminum nitride

Indexed keywords

ACTIVATION ENERGY; COPPER; COPPER ALLOYS; HEAT TREATING FURNACES; HEAT TREATMENT; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL CONSTANTS; OPTICAL PROPERTIES; REACTIVE SPUTTERING; SEMICONDUCTING CADMIUM TELLURIDE; SOLAR ENERGY; STAINLESS STEEL; SULFATE MINERALS; SYSTEM STABILITY; THERMODYNAMIC STABILITY;

ABSORPTANCE; ACCELERATED AGING TESTS; AFTER-HEAT; ALUMINUM OXYNITRIDE; COPPER SUBSTRATES; CU SUBSTRATES; ELLIPSOMETRIC DATA; LOW EMITTANCE; MAGNETRON SPUTTERING SYSTEMS; OPTICAL-; SPUTTERING; STAINLESS STEEL SUBSTRATES; TANDEM ABSORBER; THERMAL STABILITY; TITANIUM ALUMINUM NITRIDE;

SUBSTRATES;

EID: 50249129585     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.06.004     Document Type: Article

References (37)

1. Seraphin B.O. Solar energy conversion: solid state physics aspects. Topics in Applied Physics vol. 31 (1979), Springer, Berlin 24
2. Ritchie I.T., and Window B. Appl. Opt. 16 (1977) 1438
3. Zhang Q.C., and Mills D.R. J. Appl. Phys. 72 (1992) 3013
4. Barshilia H.C., Selvakumar N., Rajam K.S., Rao D.V.S., Muraleedharan K., and Biswas A. Appl. Phys. Lett. 89 (2006) 191909
5. Barshilia H.C., Selvakumar N., Rajam K.S., and Biswas A. J. Appl. Phys. 103 (2008) 023507
6. Schon J.H., Binder G., and Bucher E. Sol. Energy Mater. Sol. Cells 33 (1994) 403
7. Lee Y.K., Latt K.M., Osipowicz T., and Yi C.S. Mater. Sci. Semicond. Process. 3 (2000) 191
8. Kwak M.Y., Shin D.H., Kang T.W., and Kim K.N. Thin Solid Films 339 (1999) 290
9. Munz W.D. J. Vac. Sci. Technol. A 4 (1986) 2717
10. Park D.G., Cha T.H., Lee S.H., Yeo I.S., Park J.W., and Kim S.D. J. Vac. Sci. Technol. B 19 (2001) 2289
11. Dreer S., Krismer R., Wilhartitz P., and Friedbacher G. Thin Solid Films 354 (1999) 43
12. Demiryont H., Thompson L.R., and Collins G.J. Appl. Opt. 25 (1986) 1311
13. Araiza J.J., Frutis M.A., Falcony C., and Jergel M.A. Mater. Sci.: Mater. Electron. 16 (2005) 657
14. Yue J., Liu Y., Zhao W., and Li G. Scr. Mater. 55 (2006) 895
15. Dong Y., Yue J., Liu Y., and Li G. J. Phys. D: Appl. Phys. 39 (2006) 4838
16. Schuler A., Thommen V., Reimann P., Oelhafen P., Francz G., Zehnder T., Duggelin M., Mathys D., and Guggenheim R. J. Vac. Sci. Technol. A 19 (2001) 922
17. Smith G.B., Swift P.D., and Bendavid A. Appl. Phys. Lett. 75 (1999) 630
18. Elsevier Advanced Technology. Aluminum Nitride. second ed. (1994), Elsevier Science Ltd., UK
19. Barshilia H.C., Deepthi B., and Rajam K.S. Thin Solid Films 516 (2008) 4168
20. Zhao Z.W., Tay B.K., Yu G.Q., Chua D.H., Lau S.P., and Cheah L.K. Thin Solid Films 447/448 (2004) 14
21. Barshilia H.C., Jain A., and Rajam K.S. Vacuum 72 (2004) 241
22. Bertoti I., Mohai M., Sullivan J.L., and Saied S.O. Appl. Surf. Sci. 84 (1995) 357
23. Bertoti I. Surf. Coat. Technol. 151/152 (2002) 194
24. Hellgren N., Johansson M.P., Broitman E., Hultman L., and Sundgren J.E. Phys. Rev. B 59 (1999) 5162
25. Pratap R., and Beshai M.H.N. J. Mater. Sci. Lett. 6 (1987) 71
26. Soares G.V., Bastos K.P., Pezzi R.P., Miotti L., Driemeier C., Baumvol I.J.R., Hinkle C., and Lucovsky G. Appl. Phys. Lett. 84 (2004) 4992
27. Schroeder T., Lupina G., Sohal R., Lippert G., Wenger Ch., Seifarth O., Tallarida M., and Schmeisser D.J. J. Appl. Phys. 102 (2007) 014103
28. Wooten F. Optical Properties of Solids (1972), Academic Press, New York
29. Biswas A., Barshilia H.C., Selvakumar N., and Rajam K.S. Appl. Surf. Sci. 254 (2008) 1694
30. Heavens O.S. Optical Properties of Thin Films (1991), Dover, New York
31. Bhattacharyya D., and Biswas A. J. Appl. Phys. 97 (2005) 053501
32. Peterson R.E., and Ramsey J.W. J. Vac. Sci. Technol. 12 (1975) 174
33. Barshilia H.C., Selvakumar N., and Rajam K.S. J. Vac. Sci. Technol. A 25 (2007) 383
34. Barshilia H.C., and Rajam K.S. J. Mater. Res. 19 (2004) 3196
35. Wang Q.M., Wu Y.N., Guo M.H., Ke P.L., Gong J., Sun C., and Wen L.S. Surf. Coat. Technol. 197 (2005) 68
36. Zalar A., Baretzky B.M.M., Hofmann S., Ruhle M., and Panjan P. Thin Solid Films 352 (1999) 151
37. Zhang Z., Wang X., and Li W. J. Alloy Compd. 387 (2005) 74