Interfacial reactions in Al2O3/Ti, Al2O3Al and Al2O3/TiAl bilayers

Thin Solid Films

Volumn 352, Issue 1-2, 1999, Pages 151-155

  Zalar, A ^a   Baretzky, B M M ^b   Hofmann, S ^c   Ruhle M ^b   Panjan, P ^d  

^a Institute of Surface Engineering and Optoelectronics Ljubljana   (Slovenia)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

Aluminum oxide; Depth profiling; Diffusion; Titanium

Indexed keywords

EID: 0000683499     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00352-1     Document Type: Article

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