Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure

Materials Science in Semiconductor Processing

Volumn 3, Issue 3, 2000, Pages 191-194

  Lee, Y K ^a   Latt, Khin Maung ^a   Osipowicz, Thomas ^b   Sher Yi, Cham ^b  

^a SCHOOL OF APPLIED SCIENCE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; THERMODYNAMIC STABILITY; TITANIUM ALLOYS; X RAY DIFFRACTION;

DIFFUSION BARRIERS;

THIN FILMS;

EID: 0034200042     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00031-7     Document Type: Article

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