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Volumn 72, Issue 3, 2003, Pages 241-248

Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings

Author keywords

Nanoindentation; Reactive DC magnetron sputtering; Thermal stability; TiN CrN multilayers; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; HARDNESS; MAGNETRON SPUTTERING; MULTILAYERS; NANOSTRUCTURED MATERIALS; STRUCTURE (COMPOSITION); SUBSTRATES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

EID: 0142217260     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.08.003     Document Type: Article
Times cited : (158)

References (28)
  • 26
    • 0003494870 scopus 로고
    • Vossen JL, Kern W, editors. New York: Academic Press
    • Vossen JL, Cuomo JJ. In: Vossen JL, Kern W, editors. Thin Film Processes. New York: Academic Press; 1978. p. 58.
    • (1978) Thin Film Processes , pp. 58
    • Vossen, J.L.1    Cuomo, J.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.