Thermal stability of TiAlNTiAlON Si3 N4 tandem absorbers prepared by reactive direct current magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages 383-390

  Barshilia, Harish C ^a   Selvakumar, N ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CURRENTS; MAGNETRON SPUTTERING; STAINLESS STEEL; SUBSTRATES; SURFACE MORPHOLOGY; THERMODYNAMIC STABILITY;

NIMONIC SUBSTRATES; SILICON SUBSTRATES; SOLAR SPECTRUM REFLECTOMETER;

TITANIUM COMPOUNDS;

EID: 34248574139     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2699425     Document Type: Article

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