Raman spectroscopy studies on the thermal stability of TiN, CrN, TiAIN coatings and nanolayered TiN/CrN, TiAIN/CrN multilayer coatings

Journal of Materials Research

Volumn 19, Issue 11, 2004, Pages 3196-3205

  Barshilia, Harish C ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; HEAT TREATMENT; MAGNETRON SPUTTERING; OXIDATION; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; THERMODYNAMIC STABILITY; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

CHROMIUM NITRIDE COATINGS; MULTILAYER COATINGS;

COATINGS;

EID: 11244250899     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0444     Document Type: Article

References (35)

1. V.D. Munz: Titanium aluminium nitride films: A new alternative to TiN coatings. J. Vac. Sci. Technol. A 4, 2717 (1986).
2. H.C. Barshilia and K.S. Rajam: Characterization of Cu/Ni multilayer coatings by nanoindentation and atomic force microscopy. Surf. Coat. Technol. 155, 195 (2002).
3. H.C. Barshilia and K.S. Rajam: Deposition of TiN/CrN hard superlattices by reactive DC magnetron sputtering. Bull. Mater. Sci. 26, 233 (2003).
4. H.C. Barshilia, A. Jain, and K.S. Rajam: Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings. Vacuum 72/ 73, 241 (2004).
5. H.C. Barshilia and K.S. Rajam: Structure and properties of reactive DC magnetron sputtered TiN/NbN hard superlattices. Surf. Coat. Technol. 183, 174 (2004).
6. H.C. Barshilia, M.S. Prakash, A. Poojari, and K.S. Rajam: Corrosion behavior of nanolayered TiN/NbN multilayer coatings prepared by reactive DC magnetron sputtering process. Thin Solid Films 460, 133 (2004).
7. P. Panjan, B. Navinsek, A. Cvelbar, A. Zalar, and I. Milosev: Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature. Thin Solid Films 281-282, 298 (1996).
8. H. Ichimura and A. Kawana: High-temperature oxidation of ion-plated TiN and TiAtN films. J. Mater. Res. 8, 1093 (1993).
9. M. Franck, J-P. Celis, and J.R. Roos: Microprobe Raman spectroscopy of TiN coatings oxidized by solar beam heat treatment. J. Mater. Res. 10, 119 (1995).
10. P.H. Mayrhofer, H. Willmann, and C. Mitterer: Oxidation kinetics of sputtered Cr-N coatings. Surf. Coat. Technol. 146-147, 222 (2001).
11. Jui-Neng Tu, Jenq-Gong Duh, and Shu-Yueh. Tsai: Morphology, mechanical properties, and oxidation behavior of reactively sputtered Cr-N films. Surf. Coat. Technol. 133-134, 181 (2000).
12. H. Ichimura and A. Kawana: High temperature oxidation of ion-plated CrN films. J. Mater. Res. 9, 151 (1994).
13. 0.5N films: Kinetics and mechanisms. J. Appl. Phys. 67, 1542 (1990).
14. P. Panjan, B. Navinsek, A. Cvelbar, A. Zalar, and J. Vlcek: High temperature oxidation of TiN/CrN multilayers reactively sputtered at low temperatures. Surf. Coat. Technol. 98, 1497 (1998).
15. I. Wadsworth, I.J. Smith, L.A. Donohue, and W.D. Munz: Thermal stability and oxidation resistance of TiAlN/CrN multilayer coatings. Surf. Coat. Technol. 94-95, 315 (1997).
16. H.C. Barshilia, M.S. Prakash, A. Jain, and K.S. Rajam: Structure, hardness and thermal stability of TiAlN coatings and nanolayered TiAlN/ CrN multilayer coatings. Vacuum (in press).
17. W. Spengler and R. Kaiser: First and second order Raman scattering in transition metal compounds. Solid State Commun. 18, 881 (1976).
18. E. Vancoille, B. Blanpain, Y. Xingpu, J.P. Celis, and J.R. Roos: Tribo-oxidation of a TiN coating sliding against corundum. J. Mater. Res. 9, 992 (1994).
19. N. Muraki, V. Sergo, G. Pezzotti, G. Katagiri, S. Meriani, and T. Nishida: Raman piezo-spectroscopic behavior of aluminum nitride. Appl. Spectro. 51, 1761 (1997).
20. R. Chowdhury, R.D. Vispute, K. Jagannadham, and J. Narayan: Characteristics of titanium nitride films grown by pulsed laser deposition. J. Mater. Res. 11, 1458 (1996).
21. A. Barata, L. Cunha, and C. Moura: Characterization of chromium nitride films produced by PYD techniques. Thin Solid Films 398-399, 501 (2001).
22. M. Bernard, A. Deneuville, O. Thomas, P. Gergaud, P. Sandstrom, and J. Birch: Raman spectra of TiN/AlN superlattices. Thin Solid Films 380, 252 (2000).
23. 2 and oxidation-induced spectral changes. J. Mater. Res. 5, 1246 (1990).
24. A. Misra, H.D. Bist, M.S. Navati, R.K. Thareja, and J. Narayan: Thin film of aluminum oxide through pulsed laser deposition: A micro-Raman study. Mater. Sci. Eng. B 79, 49 (2001).
25. W. Spengler, R. Kaiser, A.N. Christensen, and G. Muller-Vogt: Raman scattering, superconductivity and phonon density of states of stoichiometric and non-stoichiometric TiN. Phys. Rev. B 17, 1095 (1978).
26. C.P. Constable, J. Yarwood, and W.D. Munz: Raman microscopic studies of PVD hard coatings. Surf. Coat. Technol. 116-119, 155 (1999 ).
27. L. Hultman: Thermal stability of nitride thin films. Vacuum 57, 1 (2000).
28. 2 thin films. Solid State Ionics 149, 99 (2002).
29. C.P. Constable, D.B. Lewis, J. Yarwood, and W.D. Munz: Raman microscopic studies of residual and applied stress in PVD hard ceramic coatings and correlation with x-ray diffraction (XRD) measurements. Surf. Coat. Technol. 184, 291 (2004).
30. I. Petrov, L. Hultman, U. Helmersson, J-E. Sundgren, and J.E. Greene: Microstructure modification of TiN by ion bombardment during reactive sputter deposition. Thin Solid Films 169, 299 (1989).
31. H. Ljungcrantz, L. Hultman, J.E. Sundgren, and L. Karlsson: Ion induced stress generation in arc-evaporated TiN films. J. Appl. Phys. 78, 832 (1995).
32. L. Hultman, U. Helmersson, S.A. Barnett, J-E. Sundgren, and J.E. Greene: Low-energy ion irradiation during film growth for reducing defect densities in epitaxial TiN (100) films deposited by reactive-magnetron sputtering. J. Appl. Phys. 61, 552 (1987).
33. 2 thin films. Appl. Phys. Lett. 57, 2692 (1990).
34. x)N coatings for cutting tools prepared by the cathodic arc ion plating method. J. Vac. Sci. Technol. A 10, 1749 (1992).
35. R.A. Andrievski, I.A. Anisimova, V.P. Anisimov, V.P. Makarov, and V.P. Popova: Grain size and recrystallization of TiN, ZrN, NbN, and CrN alloyed and multilayer films. Thin Solid Films 261, 83 (1995).