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Volumn 15, Issue 6, 1999, Pages 1899-1901

Substrate effects on the formation of alkylsiloxane monolayers

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ELECTROSTATICS; MICA; MORPHOLOGY; REACTION KINETICS; SILICA; SILICON; SUBSTRATES;

EID: 0344241128     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la981426i     Document Type: Article
Times cited : (76)

References (25)
  • 20
    • 0345527611 scopus 로고    scopus 로고
    • note
    • H2o = 4.5 mmol/L) were prepared 1 h before substrate immersion. Multiple dip experiments as described in ref 12 were carried out to ensure the negligible contribution of film transfer at the solution/air interface upon sample removal (quasi LB deposition) to the total surface coverage. The resulting submonolayer ODS films were investigated by atomic force microscopy (AFM) using a NanoScope III microscope (Digital Instruments, Santa Barbara, CA) operated in the tapping mode and the commercial software provided with this instrument. All measurements were performed in air using commercial silicon cantilevers with typical spring constants of 13-100 N/m and a resonance frequency of about 300 kHz. Details of the image analysis (height distribution and surface coverage of submonolayer films) have been reported previously (ref 12).
  • 22
    • 0345096051 scopus 로고    scopus 로고
    • note
    • 2 monolayer (ref 14).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.