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Volumn 12, Issue 20, 1996, Pages 4614-4617

Stepwise growth of ultrathin SiOx films on Si(100) surfaces through sequential adsorption/oxidation cycles of alkylsiloxane monolayers

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001669585     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la960395t     Document Type: Article
Times cited : (66)

References (27)
  • 4
    • 0029371331 scopus 로고
    • (a) Tada, H. Langmuir 1995, 11, 3281.
    • (1995) Langmuir , vol.11 , pp. 3281
    • Tada, H.1
  • 5
    • 0001745342 scopus 로고    scopus 로고
    • (b) Tada, H. Langmuir 1996, 12, 966.
    • (1996) Langmuir , vol.12 , pp. 966
    • Tada, H.1
  • 12
    • 5244290904 scopus 로고    scopus 로고
    • note
    • 3 (ref 10) and was ascribed to changes in the film structure and/or surface coverage with increasing film thickness.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.