Investigation of the role of the interplay between water and temperature on the growth of alkylsiloxane submonolayers on silicon

Langmuir

Volumn 20, Issue 13, 2004, Pages 5599-5604

  Glaser, A ^a   Foisner, J ^a   Hoffmann, H ^a   Friedbacher, Gernot ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FILM GROWTH; LOW TEMPERATURE EFFECTS; SILICONES; THERMAL EFFECTS; WATER;

DISORDERED GROWTH; HYDRODYNAMIC RADII; SUBMONOLAYER FILMS; TEMPERATURE DEPENDENCE;

MONOLAYERS;

ADSORPTION; LOW TEMPERATURE; MONOLAYERS; POLYSILICONES; THERMAL ANALYSIS; WATER;

ALKANE; SILICON; SILOXANE; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; TEMPERATURE;

ALKANES; MICROSCOPY, ATOMIC FORCE; SILICON; SILOXANES; TEMPERATURE; WATER;

EID: 3042540669     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la049910a     Document Type: Article

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