Formation mechanism of n-octadecyltrichlorosilane monolayer prepared at the air/water interface

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 169, Issue 1-3, 2000, Pages 295-306

  Kojio, Ken ^a   Takahara, Atsushi ^a   Kajiyama, Tisato ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Formation mechanism; Langmuir Blodgett method; n Octadecyltrichlorosilane (OTS) monolayer

Indexed keywords

AIR; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; ELECTRON DIFFRACTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LANGMUIR BLODGETT FILMS; MORPHOLOGY; PHASE INTERFACES; POLYMERIZATION; SILANES; TOLUENE; WATER;

FORMATION MECHANISM; FOURIER TRANSFORM INFRARED EXTERNAL REFLECTION SPECTROSCOPY; OCTADECYLTRICHLOROSILANE;

MONOLAYERS;

SILANE DERIVATIVE; TOLUENE; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; COMPRESSION; CRYSTALLIZATION; ELECTRON DIFFRACTION; INFRARED SPECTROSCOPY; POLYMERIZATION; PRIORITY JOURNAL;

EID: 0033994052     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(00)00444-1     Document Type: Article

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