Molecular printboards on silicon oxide: Lithographic patterning of cyclodextrin monolayers with multivalent, fluorescent guest molecules

Small

Volumn 1, Issue 2, 2005, Pages 242-253

  Mulder, Alart ^a   Onclin, Steffen ^a   Péter, Maria ^a   Hoogenboom, Jacob P ^a   Beijleveld, Hans ^a   Maat, Jurjen Ter ^a   García Parajó, María F ^a   Ravoo, Bart Jan ^a   Huskens, Jurriaan ^a   Van Hulst, Niek F ^a   Reinhoudt, David N ^a,b  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b Board of NanoNed   (Netherlands)

Author keywords

Cyclodextrin; Dip pen nanolithography; Laser spectroscopy; Microcontact printing; Monolayers

Indexed keywords

CYCLODEXTRIN; DIP-PEN NANOLITHOGRAPHY; LASER SPECTROSCOPY; MICROCONTACT PRINTING;

ADSORPTION; FLUORESCENCE; LITHOGRAPHY; MOLECULAR PHYSICS; MONOLAYERS; NANOTECHNOLOGY; POLYETHYLENE GLYCOLS; PRINTED CIRCUIT BOARDS; SCANNING TUNNELING MICROSCOPY;

SILICA;

ACRYLONITRILE; BETA CYCLODEXTRIN; BETA CYCLODEXTRIN DERIVATIVE; CYCLODEXTRIN; DICHLOROMETHANE; FLUORESCENT DYE; INK; MACROGOL DERIVATIVE; NANOMATERIAL; SILICON DIOXIDE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; CONFOCAL MICROSCOPY; LASER; METHODOLOGY; NANOTECHNOLOGY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SPECTROPHOTOMETRY;

ACRYLONITRILE; BETA-CYCLODEXTRINS; CYCLODEXTRINS; FLUORESCENT DYES; INK; LASERS; MAGNETIC RESONANCE SPECTROSCOPY; METHYLENE CHLORIDE; MICROSCOPY, CONFOCAL; MODELS, CHEMICAL; NANOSTRUCTURES; NANOTECHNOLOGY; POLYETHYLENE GLYCOLS; SILICON DIOXIDE; SPECTROPHOTOMETRY;

EID: 22444433415     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200400063     Document Type: Article

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