New base-soluble positive-working photosensitive polyimides having o-nitrobenzyl ester group

Polymers for Advanced Technologies

Volumn 16, Issue 5, 2005, Pages 387-392

  Choi, Kyong Ho ^a   Jung, Jin Chul ^a   Kim, Kyoung Seon ^b   Kim, Jin Baek ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Alkali developable; Esterification; FT IR; Photosensitive; Polyimides

Indexed keywords

ABSORPTION; ESTERIFICATION; ESTERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL);

LITHOGRAPHIC PROCESSES; NITROBENZYL BROMIDES; PHOTOSENSITIVE POLYIMIDES; SENSITIVITY CURVES;

POLYAMIDES;

POLYMER SCIENCE;

EID: 18944387370     PISSN: 10427147     EISSN: None     Source Type: Journal    
DOI: 10.1002/pat.601     Document Type: Article

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