Effect of photo-active compound structure on photosensitivity of positive photosensitive polyimide

High Performance Polymers

Volumn 18, Issue 5, 2006, Pages 603-615

  Tomikawa, Masao ^a   Yuba, Tomoyuki ^a   Ohbayashi, Gentaro ^a   Kim, Jae Hyun ^b   Kim, Youngho ^b   Kim, Taesung ^b  

^a Electronic and Imaging Materials Research Laboratories   (Japan)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Development loss; Dipole moment; Photo active compound; Positive tone photo sensitive polyimide

Indexed keywords

DISSOLUTION; MOLECULAR ORIENTATION; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; REACTION KINETICS;

DEVELOPMENT LOSSES; DIPOLE MOMENT; PHOTO ACTIVE COMPOUNDS; POSITIVE TONE PHOTO SENSITIVE POLYIMIDES;

POLYIMIDES;

EID: 33748980124     PISSN: 09540083     EISSN: 13616412     Source Type: Journal    
DOI: 10.1177/0954008306068141     Document Type: Conference Paper

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