A novel positive-type photosensitive polyimide based on soluble block copolyimide showing low dielectric constant with a low-temperature curing process

Journal of Applied Polymer Science

Volumn 100, Issue 5, 2006, Pages 4240-4246

  Jin, XingZhou ^a   Ishii, Hiroyuki ^a  

^a PI R and D Co Ltd   (Japan)

Author keywords

Lithography; Polyimides; Refractive index; Thermal properties

Indexed keywords

CATALYSTS; LITHOGRAPHY; OPTICAL PROPERTIES; PERMITTIVITY; POLYCONDENSATION; POLYIMIDES; REFRACTIVE INDEX; SENSITIVITY ANALYSIS; SUPERCONDUCTING TRANSITION TEMPERATURE;

BLOCK COPOLYIMIDE; THERMAL PROPERTIES; THERMAL TRANSMISSION TEMPERATURE; TRANSPARENT FILMS;

BLOCK COPOLYMERS;

BLOCK COPOLYMER; CATALYST; CONDENSATION POLYMER; DIELECTRIC PROPERTY; POLYIMIDE;

EID: 33646357472     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.23806     Document Type: Article

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