Positive-working alkaline-developable photosensitive polyimide precursor based on poly(amic acid) and dissolution inhibitor

Journal of Photopolymer Science and Technology

Volumn 10, Issue 1, 1997, Pages 55-60

  Haba, Osamu ^a   Okazaki, Masaki ^a   Nakayama, Tomonari ^a   Ueda, Mitsuru ^a  

^a YAMAGATA UNIVERSITY   (Japan)

Author keywords

Dissolution inhibitor; Photosensitive; Poly(amic acid); Polyimide

Indexed keywords

EID: 0002426813     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.55     Document Type: Article

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