Novel Positive-Working Aqueous-Base Developable Photosensitive Polyimide Precursors Based on Diazonaphthoquinone-Capped Polyamic Esters

Journal of Applied Polymer Science

Volumn 90, Issue 8, 2003, Pages 2293-2300

  Hsu, Steve Lien Chung ^a   Lee, Po I ^a   King, Jinn Shing ^b   Jeng, Jyh Long ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Diazonaphthoquinone; Photoresists; Polyimides; Positive working; Synthesis

Indexed keywords

ESTERS; PHOTORESISTS; PHOTOSENSITIVITY; SYNTHESIS (CHEMICAL);

PRECURSORS;

POLYIMIDES;

POLYIMIDE; POLYMER SCIENCE;

EID: 0142157258     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.12905     Document Type: Article

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