Photosensitive fluorinated polyimides with a low dielectric constant based on reaction development patterning

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 41, Issue 6, 2003, Pages 861-871

  Miyagawa, Tomoko ^a   Fukushima, Takafumi ^a   Oyama, Toshiyuki ^a   Iijima, Takao ^a   Tomoi, Masao ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

Diazonaphthoquinone compound; Dielectric properties; Photoresists; Polycondensation; Polyimides; Reaction development patterning (RDP)

Indexed keywords

BLOCK COPOLYMERS; FLUORINE CONTAINING POLYMERS; MOLECULAR DYNAMICS; PERMITTIVITY; PHOTORESISTS; PHOTOSENSITIVITY; POLYCONDENSATION; THERMAL EXPANSION; ULTRAVIOLET RADIATION;

DIAZONAPHTHOQUINONE COMPOUND; PHOTOSENSITIVE FLUORINATED POLYIMIDES; REACTION DEVELOPMENT PATTERNING;

POLYIMIDES;

POLYIMIDE;

EID: 0037445493     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.10638     Document Type: Article

References (28)

1. Van Krevelen, D. W. Properties of Polymers, 3rd ed.; Elsevier Amsterdam, 1990, p 321.
2. Misra, A. C.; Tesoro, G.; Hougham, G.; Pendharkar, S. M. Polymer 1992, 33, 1078
3. Hayashi, S.; Nishikimi, T.; Yamamoto, M.; Yamamoto, K. Nittogiho Tech Rep 1990, 28(2), 49.
4. Simpson, J. O.; St. Clair, A. K. Thin Solid Films 1997, 308, 480.
5. Matsuura, T.; Ishizawa, M.; Hasuda, Y.; Nishi, S. Macromolecules 192, 25, 3540.
6. Hougham, G.; Tesoro, G.; Viehbeck, A.; Chapple-Sokol, J. D. Macromolecules 1994, 27, 5964.
7. Auman, B. C.; Myers, T. L.; Higley, D. P. J. Polym Sci Part A: Polym Chem 1997, 35, 2441.
8. Yang, J. W.; Wang, C. S. Polymer 1999, 40, 1411.
9. Hasegawa, M. High Perform Polym 2001, 13, 93.
10. Matsuura, T.; Ando, S.; Sasaki, S.; Yamamoto, F. Macromolecules 1994, 27, 6665.
11. Matsuura, T. J Photopolym Sci Technol 1997, 10, 31.
12. Omote, T.; Mochizuki, H.; Koseki, K.; Yamaoka, T. Macromolecules 1990, 23, 4796.
13. Omete, T.; Koseki, K.; Yamaoka, T. Macromolecules 1990, 23, 4788.
14. Naitoh, K.; Ishii, K.; Yamaoka, T.; Omote, T. Polym Adv Technol 1993, 4, 294.
15. Nakayama, T.; Mochizuki, A.; Ueda, M. React Funct Polym 1996, 30, 109.
16. Ueda, M.; Nakayama, T. Macromolecules 1996, 29, 6427.
17. Seino, H,; Mochizuki, A.; Haba, O.; Ueda, M. J Polym Sci Part A: Polym Chem 1998, 36, 2261.
18. Fukushima, T.; Hosokawa, K.; Oyama, T.; Iijima, T.; Tomoi, M.; Itatani, H. J Polym Sci Part A: Polym Chem 2001, 39, 934.
19. Omote, T. In Polyimides: Fundamental and Applications; Ghosh, N. K.; Mittal, K. L. Eds.; Marcel Dekker; New York, 1996, pp 121-149.
20. Numata, S.; Fujisaki, K.; Kinjo, N. Polymer 1987, 28, 2282.
21. Fukushima, T.; Oyama, T.; Iijima, T.; Tomoi, M.; Itatani, H. J Polym Sci Part A: Polym Chem 2001, 39, 3451.
22. Oyama, T.; Kawakami, Y.; Fukushima, T.; Iijima, T.; Tomoi, M. Polym Bull 2001, 47, 175.
23. Oyama, T.; Kitamura, A.; Fukushima, T.; Iijima, T.; Tomoi, M. Macromol Rapid Commun 2002, 23, 104.
24. Fukushima, T.; Kawakami, Y.; Oyama, T.; Iijima, T.; Tomoi, M. J Photopolym Sci Technol 2002, 15, 191.
25. Oie, Y.; Itatani, H. U.S. Patent 5,502,143, 1996.
26. Broers, A. N. Am Chem Soc Symp Ser 1984, 266, 11.
27. Dielectric Materials and Applications; Von Hippel, A. R., Ed.; Artech House: Norwood, MA, 1995.
28. Souza-Machado, R. D.; Wu, S. Y.; Denton, D. D. In Polyimides: Fundamental and Applications; Ghosh, N. K.;Mittal, K. L., Eds.; Marcel Dekker: New York, 1996, pp 309-341.