Positive-type photosensitive polyimide based on a photobase generator containing oxime-urethane groups as a photosensitive compound

Macromolecular Research

Volumn 14, Issue 3, 2006, Pages 300-305

  Jang, Young Min ^a   Seo, Ji Young ^a   Chae, Kyu Ho ^a   Yi, Mi Hye ^b  

^a Chonnam National University   (South Korea)

^b Korea Research Institute of Chemical Technology   (South Korea)

Author keywords

Irradiation; Photobase generator; Photosensitive compound; Photosensitive polyimide; Positive photoresist

Indexed keywords

EID: 33745872553     PISSN: 15985032     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF03219085     Document Type: Article

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