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Volumn 14, Issue 4, 2002, Pages 1762-1766

A new positive-type photosensitive alkaline-developable alicyclic polyimide based on poly(amic acid silylester) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

(4) Watanabe, Yasufumi a Shibasaki, Yuji a Ando, Shinji a Ueda, Mitsuru a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

2,3,4 TRIS[2 DIAZO 1(2H) NAPHTHALENONE 4 SULFONYLOXY]BENZOPHENONE; ALICYCLIC COMPOUND; BENZOPHENONE DERIVATIVE; CARBOXYLIC ACID DERIVATIVE; POLY(AMIC ACID TERT BUTYL DIMETHYLSILYL ESTER); UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL ANALYSIS; DISSOLUTION; FILM; IMAGE ANALYSIS; MOLECULAR DYNAMICS; PHOTOSENSITIVITY; SYNTHESIS; THERMOSTABILITY; ULTRAVIOLET SPECTROSCOPY;

EID: 0036117852 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm0115362 Document Type: Article

Times cited : (30)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.