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Volumn 24, Issue 8, 2008, Pages 3888-3896

Formation of aromatic siloxane self-assembled monolayers

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMISORPTION; SELF ASSEMBLED MONOLAYERS; SILICON WAFERS; THIN FILMS;

EID: 42449163021     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la703326m     Document Type: Article
Times cited : (33)

References (94)
  • 3
    • 0037051030 scopus 로고    scopus 로고
    • Bent, S. F. Surf. Sci. 2002, 500, 879-903.
    • (2002) Surf. Sci , vol.500 , pp. 879-903
    • Bent, S.F.1
  • 80
    • 0002453853 scopus 로고
    • Matijević, E, Ed, Wiley-Interscience: New York
    • Johnson, R. E.; Dettre, R. In Surface Colloid Science; Matijević, E., Ed.; Wiley-Interscience: New York, 1969; Vol. 2, pp 85-153.
    • (1969) Surface Colloid Science , vol.2 , pp. 85-153
    • Johnson, R.E.1    Dettre, R.2
  • 81
    • 42449142219 scopus 로고    scopus 로고
    • Theoretical surface coverages for ECMPS and CMPS SAMs were estimated using Scheme 1 and the following two equations: (A) coverage (CMP molecules-cm-2) ≅ (1016 Å2· cm-2)/X, where X, footprint area (Å2/ molecule) from Scheme 1, B) coverage (mol of CMP·cm-2, ≅ coverage (CMP molecules·cm-2)/6.023 × 10 23 CMP molecules-mol of CMP-1, The average spacing for the CMPS SAM tested as an imaging layer, assuming a square array of CMP groups on the surface: molecular spacing (square array) ≅, 1016 Å2·cm-2, CMPS coverage (CMP molecules·cm-2)]0.5 ≅, 1016 Å2·cm-2, 2.84 ± 0.22) · 1014} CMPS molecules·cm-2]0.5 ≅ 5.9 ± 0.3 Å·CMP
    • -1.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.