Control of micro- and nanopatterns of octadecyltrimethoxysilane monolayers using nanoimprint lithography and atmospheric chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 1, 2007, Pages 17-20

  Ressier, Laurence ^a   Martin, Christel ^a   Viallet, Benòt ^a   Grisolia, J́ŕmie ^a   Peyrade, Jean Pierre ^a  

^a LNMO   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURED MATERIALS; SILANES;

ATMOSPHERIC CHEMICAL VAPOR DEPOSITION; MONOLAYER SQUARE PATTERNS; NANOPATTERNS;

SELF ASSEMBLED MONOLAYERS;

LITHOGRAPHY; MONOLAYERS; SILANES;

EID: 34047112410     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2402144     Document Type: Article

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