Growth kinetics and morphology of self-assembled monolayers formed by contact printing 7-octenyltrichlorosilane and octadecyltrichlorosilane on Si(100) wafers

Langmuir

Volumn 20, Issue 25, 2004, Pages 10878-10888

  Harada, Yoshiko ^a   Girolami, Gregory S ^a   Nuzzo, Ralph G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT HUMIDITY; INK CONCENTRATION; LANGMUIR ADSORPTION KINETICS; MASS TRANSFER DYNAMICS;

ADSORPTION; ATOMIC FORCE MICROSCOPY; FILM GROWTH; GROWTH KINETICS; MORPHOLOGY; OLIGOMERS; SELF ASSEMBLY; SILICON; WSI CIRCUITS;

MONOLAYERS;

7 OCTENYLTRICHLOROSILANE; 7-OCTENYLTRICHLOROSILANE; BAYSILON; DIMETICONE; OCTADECYLTRICHLOROSILANE; SILANE DERIVATIVE; SILICON; SILICONE DERIVATIVE;

ADSORPTION; ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; HYDROLYSIS; KINETICS; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTY; TIME;

ADSORPTION; DIMETHYLPOLYSILOXANES; HYDROLYSIS; KINETICS; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY; SILANES; SILICON; SILICONES; SURFACE PROPERTIES; TIME FACTORS;

ADSORPTION; MONOLAYERS; SILICON;

EID: 10444252735     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la040038f     Document Type: Article

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