Impact of oxidation-induced strain on microscopic processes related to oxidation reaction at the Si O2 Si (100) interface

Physical Review B - Condensed Matter and Materials Physics

Volumn 77, Issue 11, 2008, Pages

  Akiyama, Toru ^a   Ito, Tomonori ^a   Kageshima, Hiroyuki ^b   Uematsu, Masashi ^b  

^a MIE UNIVERSITY   (Japan)

^b NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 41549134450     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.77.115356     Document Type: Article

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