Multiscale modeling of oxygen diffusion through the oxide during silicon oxidation

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 19, 2004, Pages 1-14

  Bongiorno, Angelo ^a,c   Pasquarello, Alfredo ^b  

^a EPFL   (Switzerland)

^b INSTITUT ROMAND DE RECHERCHE NUMÉRIQUE EN PHYSIQUE DES MATÉRIAUX IRRMA   (Switzerland)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; SILICON DIOXIDE;

ARTICLE; CHEMICAL STRUCTURE; CONDUCTANCE; DENSITY FUNCTIONAL THEORY; MONTE CARLO METHOD; OXIDATION; OXYGEN DIFFUSION; SIMULATION;

EID: 12344279831     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.195312     Document Type: Article

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