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Physical Review Letters

Volumn 96, Issue 19, 2006, Pages

International technology roadmap for semiconductors 2005 edition

(3) Watanabe, Takanobu a,b Tatsumura, Kosuke a Ohdomari, Iwao a

a WASEDA UNIVERSITY (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; OXIDATION; SILICA;

DEAL-GROVE MODEL; INTERFACIAL REACTION; PARABOLIC CONSTANT; STRUCTURAL TRANSITION LAYERS;

SEMICONDUCTOR MATERIALS;

EID: 33646847886 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.96.196102 Document Type: Article

Times cited : (71)

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