SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 406-409

Structural characterization of pulsed laser-deposited AlN thin films on semiconductor substrates

(4) Kumar, Ashok a Chan, H L a Weimer, J J b Sanderson, L b

a University of South Alabama (United States)

b The University of Alabama in Huntsville (United States)

Author keywords

Aluminum nitride; Crystalline; Hardness; Pulsed laser deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE ROUGHNESS; X RAY CRYSTALLOGRAPHY;

ALUMINUM NITRIDE; NANOINDENTATION; PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0031250441 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00674-3 Document Type: Article

Times cited : (42)

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