Reactively DC magnetron sputtered thin A1N films studied by X-ray photoelectron spectroscopy and polarised infrared reflection

Vacuum

Volumn 52, Issue 3, 1999, Pages 301-305

  Manova, D ^a   Dimitrova, V ^a   Karpuzov, D ^b   Yankov, R ^c  

^a UNIVERSITY OF RUSE   (Bulgaria)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; ELECTRON BEAMS; ELECTRON DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; MORPHOLOGY; NITRIDES; SPUTTER DEPOSITION; THIN FILMS; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDES; POLARIZED INFRARED REFLECTION;

OPTICAL FILMS;

EID: 0033098908     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00303-0     Document Type: Article

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