Aluminium nitride thin films deposited by DC reactive magnetron sputtering

Vacuum

Volumn 51, Issue 2, 1998, Pages 161-164

  Dimitrova, V ^a   Manova, D ^a   Paskova, T ^b   Uzunov, Tz ^c   Ivanov, N ^c   Dechev, D ^c  

^a UNIVERSITY OF RUSE   (Bulgaria)

^b UNIVERSITY OF SOFIA   (Bulgaria)

^c TECHNICAL UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; INFRARED RADIATION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; MICROHARDNESS; NITRIDES; OPACITY; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SPUTTER DEPOSITION; THIN FILMS;

ALUMINUM NITRIDE; REACTIVE MAGNETRON SPUTTERING;

CONDUCTIVE FILMS;

EID: 0032183526     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00150-x     Document Type: Article

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