Percolation threshold in ultrathin titanium films determined by in situ spectroscopic ellipsometry

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 19, 2004, Pages 1-6

  Oates, T W H ^a,b   McKenzie, D R ^a   Bilek, M M M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

TITANIUM;

ARTICLE; CONDUCTANCE; ELLIPSOMETRY; FILM; MATHEMATICAL ANALYSIS; MATHEMATICAL COMPUTING; PHYSICOCHEMICAL MODEL; SPECTROSCOPY; THICKNESS;

EID: 12344275296     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.195406     Document Type: Article

References (20)

1. A. Anders, W. Fong, A. V. Kulkarni, F. W. Ryan, and C. S. Bhatia, IEEE Trans. Plasma Sci. 29, 768 (2001).
2. D. R. McKenzie, R. N. Tarrant, M. M.M. Bilek, T. Ha, J. Zou, W. E. McBride, D. J.H. Cockayne, N. Fujisawa, M. V. Swain, N. L. James, J. C. Woodard, and D. G. McCulloch, Diamond Relat. Mater. 12, 178 (2003).
3. T. W. H. Oates and M. M. M. Bilek, J. Appl. Phys. 92, 2980 (2002).
4. R. J. Martin-Palma, L. Vazquez, J. M. Martinez-Duart, and A. Malats-Riera, Sol. Energy Mater. Sol. Cells 53, 55 (1998).
5. T. W. H. Oates, J. Pigott, D. R. McKenzie, and M. M. M. Bilek, Rev. Sci. Instrum. 714, 4750 (2003).
6. A. I. Maroof and B. L. Evans, J. Appl. Phys. 76, 1047 (1994).
7. H. V. Nguyen, I. An, and R. W. Collins, Phys. Rev. B 47, 3947 (1993).
8. H. Arwin and D. E. Aspnes, Thin Solid Films 113, 101 (1984).
9. L. Ryves, M. M. M. Bilek, T. W. H. Oates, R. N. Tarrant, D. R. McKenzie, F. A. Burgmann, and D. G. McCulloch, Proceedings of EMRS 2004, Strasbourg, France, 2004 [Thin Solid Films (to be published)].
10. E. D. Palik, Handbook of Optical Constants of Solids (Academic, Orlando, 1985).
11. M. Ohring, Materials Science of Thin Films; Deposition and Structure, 2nd ed. (Academic, San Diego, 2002).
12. P. Drude, Ann. Phys. (Leipzig) 1, 566 (1900).
13. C. Kittel, Introduction to Solid State Physics, 7th ed. (Wiley, New York, 1996).
14. H. -D. Liu, Y. -P. Zhao, G. Ramanath, S. P. Murarka, and G. -C. Wang, Thin Solid Films 384, 151 (2001).
15. T. J. Coutts, Electrical Conduction in Thin Metal Films (Elsevier, Amsterdam, 1974).
16. L. Benguigui, Phys. Rev. Lett. 53, 2028 (1984).
17. K. Sieradzki, K. Bailey, and T. L. Alford, Appl. Phys. Lett. 79, 3401 (2001).
18. A. Okazaki, K. Horibe, K. Maruyama, and S. Miyazima, Phys. Rev. E 61, 6215 (2000).
19. M. Verdon (private communication).
20. P. Bieganski, E. Dobierzewska-Mozrzymas, E. Pieciul, and G. Szymczak, Vacuum 74, 211 (2004).