Accurate and rapid determination of thickness, n and k spectra, and resistivity of indium-tin-oxide films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1843-1847

  Zhang, K ^a   Forouhi, A R ^b   Bloomer, I ^b  

^a EGandG Amorphous Silicon   (United States)

^b Nandk Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSION EQUATIONS; ENERGY BANDGAPS; EXTINCTION COEFFICIENTS; INDIUM TIN OXIDE; ITO FILMS; MEASUREMENT TECHNIQUES; NON DESTRUCTIVE; OPAQUE SUBSTRATES; OPTIMUM BALANCE; RAPID DETERMINATION; SPECTRAL ANALYSIS; TRANSPARENT CONDUCTORS; VISIBLE WAVELENGTHS; WIDE-BAND;

FLAT PANEL DISPLAYS; INDIUM; REFRACTIVE INDEX; SPECTRUM ANALYSIS; TIN;

OXIDE FILMS;

EID: 0001252988     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581902     Document Type: Conference Paper

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