Transport phenomena in high performance nanocrystalline ZnO:Ga films deposited by plasma-enhanced chemical vapor deposition

Thin Solid Films

Volumn 473, Issue 1, 2005, Pages 35-40

  Robbins, J J ^a   Harvey, J ^a   Leaf, J ^a   Fry, C ^a   Wolden, C A ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

112 electrical properties and measurements; 345 optical properties; 373 plasma processing and deposition; 563 zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC RESISTANCE; GRAIN SIZE AND SHAPE; LIGHT TRANSMISSION; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

112-ELECTRICAL PROPERTIES AND MEASUREMENTS; 345-OPTICAL PROPERTIES; 373-PLASMA PROCESSING AND DEPOSITION; 563-ZINC OXIDE;

ZINC OXIDE;

EID: 9644257257     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.154     Document Type: Article

References (19)

1. T. Minami, H. Nanto, S. Shooji, S. Takata, Thin Solid Films 111 (1984) 167.
2. M. Hiramatsu, K. Imaeda, N. Horio, M. Nawata, J. Vac. Sci. Technol., A 16 (1998) 669.
3. T. Shiosaki, T. Yamamoto, M. Yagi, A. Kawabata, Appl. Phys. Lett. 39 (1981) 399.
4. B.S. Li, Y.C. Liu, Z.S. Chu, D.Z. Shen, Y.M. Lu, J.Y. Zhang, X.W. Fan, J. Appl. Phys. 91 (2002) 501.
5. J.J. Robbins, J. Esteban, C. Fry, C.A. Wolden, J. Electrochem. Soc. 150 (2003) C693.
6. R. Groenen, J. Loffler, P.M. Sommeling, J.L. Linden, E.A.G. Hamers, R.E.I. Schropp, M.C.M. van de Sanden, Thin Solid Films 392 (2001) 226.
7. J. Hu, R.G. Gordon, J. Appl. Phys. 72 (1992) 5381.
8. Y. Li, G.S. Tompa, S. Liang, C. Gorla, Y. Lu, J. Doyle, J. Vac. Sci. Technol., A 15 (1997) 10363.
9. J.J. Robbins, C. Fry, C.A. Wolden, J. Cryst. Growth 263 (2004) 283.
10. S.R. Schmidt, R.G. Launsby, Understanding Industrial Designed Experiments, 4th ed., Air Academy Press, Colorado Springs, 2000.
11. TFCalc Version 3.4, Software Spectra, Portland, OR, 1999.
12. T.J. Coutts, X. Wu, W.P. Mulligan, J.M. Webb, J. Electron. Mater. 25 (1996) 935.
13. J. Proscia, R.G. Gordon, Thin Solid Films 214 (1992) 175.
14. H.L. Hartnagel, A.L. Dawar, A.K. Jain, C. Jagadish, Semiconducting Transparent Thin Films, Institute of Physics Publishing, Philadelphia, 1995.
15. T. Minami, MRS Bull. 25 (2000) 38.
16. J. Seto, J. Appl. Phys. 46 (1975) 5247.
17. D.H. Zhang, H.L. Ma, Appl. Phys., A 62 (1996) 487.
18. J. Bruneaux, H. Cachet, M. Froment, A. Messad, Thin Solid Films 197 (1991) 129.
19. J.R. Bellingham, W.A. Phillips, C.J. Adkins, J. Mater. Sci. Lett. 11 (1992) 263.