Ellipsometric characterization of expanding thermal plasma deposited SiO2-like films

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 137-141

  Creatore, M ^a   Kilic, M ^a   O'Brien, K ^a   Groenen, R ^a   Van de Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Ellipsometry; Expanding thermal plasma; SiO2 like films

Indexed keywords

COMPOSITION; DEPOSITION; ELLIPSOMETRY; PLASTIC FILMS; POROSITY; REFRACTIVE INDEX; SILICA;

EXPANDING THERMAL PLASMA;

SEMICONDUCTING FILMS;

EID: 0037416612     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01161-6     Document Type: Article

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