Image-blur tolerances for 65nm and 45nm-node IC manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1570-1580

  Lalovic, Ivan ^a   Kroyan, Armen ^b   Kye, Jongwook ^a   Liu, Hua Yu ^b   Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b SYNOPSYS INC   (United States)

Author keywords

193nm and 157nm lithography; Contrast; Fading; Image blur; Scanning optics; Stage synchronization error

Indexed keywords

ABERRATIONS; ERRORS; IMAGE QUALITY; INTEGRATED CIRCUIT MANUFACTURE; LIGHT SCATTERING; OPTICS; SCANNING;

IMAGE BLUR TOLERANCES; SCAN INDUCED ERRORS;

PHOTOLITHOGRAPHY;

EID: 0141498228     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485510     Document Type: Conference Paper

References (8)

1. H. J. Levinson, Principles of Lithography, pp 171-174, SPIE Press, Bellingham, Washington, 2001.
2. A. Kroyan et al., "Modeling the effects of eximer laser bandwidths on lithographic performance," Proc. SPIE Optical Microlithography XIII 4000, 65 (2000).
3. P. Yan et al., "Effects of chromatic aberration in excimer laser lithography," Proc. SPIE Optical/Laser Microlithography V 1674, pp. 316-327 (1992).
4. I. Lalovic et al., "Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6NA KrF imaging," Proc. BACUS XXI Photomask Technology Symposium 4562, 112 (2001).
5. D. Flagello et al., "Optical lithography into the millennium: Sensitivity to Aberrations, Vibration and Polarization," Proc. SPIE Optical Microlithography XIII 4000, 16 (2000).
6. M. Klassen et al., "Dynamic Performance of DUV Step & Scan Systems and Process Latitude," Proc. SPIE Optical Microlithography XIII 4000, 78 (2000).
7. E. Luce et al., "Impact of synchronization errors on overlay and CD control," Proc. SPIE Optical Microlithography XV 4691, 85 (2002).
8. H. J. Levinson, "Equipment for DUV Lithography," Presented at Semicon West, San Francisco, CA, 1997.