A new concept for an alkaline developable positive-tone resist: Molecular resist utilizing acid catalyzed isomerization from oxabenzonorbornadiene to naphthol

Macromolecular Rapid Communications

Volumn 29, Issue 1, 2008, Pages 39-44

  Mori, Hajime ^a   Nomura, Eisaku ^a,b   Hosoda, Asao ^a   Miyake, Yasuhito ^a   Taniguchi, Hisaji ^a  

^a INDUSTRIAL TECHNOLOGY CENTER OF WAKAYAMA PREFECTURE   (Japan)

^b WAKAYAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous materials; Lithography; Oxygen heterocycles; Resists

Indexed keywords

ACIDITY; CATALYSIS; ELECTRON BEAM LITHOGRAPHY; ISOMERIZATION; NAPHTHALENE;

OXABENZONORBORNADIENE; POST EXPOSURE BAKE PROCEDURE; RESIST MATERIALS;

AMORPHOUS MATERIALS;

ACIDITY; AMORPHOUS MATERIALS; CATALYSTS; ISOMERIZATION; LITHOGRAPHY; NAPHTHA; OXYGEN HETEROCYCLES;

EID: 38049132455     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.200700604     Document Type: Article

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