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Volumn 18, Issue 3, 2005, Pages 393-398

Resist characteristics of acryl polymer with methyl acetal protecting group for 193 nm lithography

Author keywords

Chemical amplification positive tone resist; Deprotection reactivity; Methyl acetal protecting group; PEB sensitivity

Indexed keywords

EID: 22144475459 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.18.393 Document Type: Article

Times cited : (16)

References (13)

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